Seventh International Conference on Fundamentals and Industrial Applications of HIPIMS

29 - 30 June 2016, Sheffield, UK

Venue: Cutlers' Hall

 

 

Programme of Events

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Wednesday, 29 June 2016

8:00-8:30

REGISTRATION AT CUTLERS’ HALL

8:30-8:40

WELCOME ADDRESS:

Prof. Wayne Cranton, Board member Joint SHU-Fraunhofer IST HIPIMS Research Centre

Prof. Günter Bräuer, Director Fraunhofer IST

Prof. Arutiun P. Ehiasarian, Conference Chairman

Morning Session.

Moderator: Ralf Bandorf, Fraunhofer IST, Germany

8:40-9:00 HIPIMS ITO from ceramic and metallic rotating cathodes .

F.C. Carreri 1,2 , R. Bandorf1, H. Gerdes1, E. Schröder1, M. Vergöhl1, G. Bräuer1

1 Fraunhofer Institute for Surface Engineering and Thin Films (IST), Bienroder Weg 54E, 38108 Braunschweig, Germany.

2 CAPES Foundation, Ministry of Education of Brazil, Caixa Postal 250, Brasília-DF 70040-020, Brazil.

9:00-9:20 HiPIMS Deposition of Tungsten Trioxide Thin Films.

A.Belajevs , M. Zubkins., R. Kalendarev, J. Gabrusenoks, J. Purans

Institute of Solid State Physics, University of Latvia, Kengaraga str 8, LV-1063, Riga, Latvia

9:20-9:40 High-rate reactive high-power impulse magnetron sputtering of Hf-O-N films with tunable composition and properties

A. Belosludtsev, J. Vlcek, S. Haviar, J. Houška, R. Cerstvý, J. Rezek

Department of Physics and NTIS – European Centre of Excellence, University of West Bohemia, Univerzitni 8, 30614 Plzen, Czech Republic

9:40-10:00 HiPIMS plasma diagnostic and low temperature deposition of photo-active Titania thin films in an industrial-scale rig.

B. Delfour-Peyrethon, G. West, M. Ratova, P. Kelly,

Manchester Metropolitan University, Manchester, United Kingdom

10:00-10:20 Electrical insulation performance of aluminum oxide layers on metallic substrates – HiPIMS compared to RF-MS

F. Schmaljohann , D. Hagedorn, F. Löffler

Physikalisch-Technische Bundesanstalt, Bundesallee 100, Braunschweig, Germany

10:20-10:40 COFFEE BREAK, POSTER SESSION AND EXHIBITION

Second Morning Session.

Moderator: Roel Tietema, Hauzer Techno Coating, The Netherlands

10:40-11:00 Target and substrate composition in reactive high-power impulse magnetron sputtering — a modelling study

T.Kozak , J. Vlcek

Department of Physics and NTIS – European Centre of Excellence, University of West Bohemia, Univerzitni 8, 306 14 Plzen, Czech Republic

11:00-11:20 Deposition of Titanium Oxide Films by Current-Controlled High Power Impulse Magnetron Sputtering

A. Heisig1, D.A.L. Loch2, P.Eh. Hovsepian2, A.P. Ehiasarian2,

1) Von Ardenne GmbH, Plattleite 19/29, 01324 Dresden, Germany

2) National HIPIMS Technology Centre, Sheffield Hallam University, Howard St., Sheffield, UK

11:20-11:40 Wave phenomena and instabilities in direct current magnetron sputtering and high power impulse magnetron sputtering plasmas

C. Maszl, A. Hecimovic, J. Benedikt and A. von Keudell

Research Department Plasmas with Complex Interactions, Ruhr-Universität Bochum, Institute for Experimental Physics II, Universitystr. 150, D-44780 Bochum, Germany

11:40-12:00 Observation of breathing modes in high power impulse magnetron sputtering plasmas

A. Anders 1 and Y. Yang,1,2

1 Lawrence Berkeley National Laboratory, Berkeley, California, USA

2 School of Materials Science and Engineering, State Key Lab for Materials Processing and Die & Mold Technology, Huazhong University of Science and Technology, Wuhan, China

12:00-12:20 Anomalous cross-B field transport and spokes in HiPIMS plasma.

A. Hecimovic , C. Maszl, V. Schulz-von der Gathen, A. von Keudell

Institute for experimental physics II, Research department plasmas with complex interactions, Ruhr-Universität Bochum, Germany

12:20-14:00 LUNCH BREAK and Conference Photograph

Programme of Events

Wednesday, 29 June 2016

First Afternoon Session.

Moderator: Gery van der Kolk, IonBond, The Netherlands

14:00-14:20 HiPIMS Plasma Measurements by Triple and Target Strip Probes

F.L. Estrin and James W. Bradley

Dept. of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ, UK

14:20-14:40 Optimized Magnetic Field Configuration for High Power Impulse Magnetron Sputtering

D. Ruzic 1 , P. Raman1, I. Shchelkanov1,2, J. McLain1, M. Cheng1, B. Jurczyk3, R. Stubbers3

1Center for Plasma Material Interactions, University of Illinois, Urbana, USA

2 Plasma Physics Department, National Nuclear Reassert University (MEPhI), Moscow, Russia

3Starfire Industries, LLC, Champaign IL, USA

14:40-15:00 Optical Emission Spectroscopy of a Controlled Reactive HiPIMS During a High-Rate Deposition of Densified Stoichiometric ZrO2 Films

A.D. Pajdarová, J. Vlcek and J. Rezek

Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia,Univerzitni 8, 306 14 Plzen, Czech Republic

15:00-15:20 Plasma Analysis of Inductively Coupled Impulse Sputtering by Investigation of Cu, Ti and Ni species

D.A. Loch1, Y. Aranda Gonzalvo2, A.P. Ehiasarian1

1 Sheffield Hallam University, HIPIMS Technology Centre, Howard Street, Sheffield, UK

2 HIDEN Analytical Ltd, Europa Boulevard, Warrington, UK / University of Minnesota, USA

15:20-15:40 Space-resolved Plasma Diagnostics in a dcMS/HPPMS Hybrid (Cr,Al)N process

K. Bobzin, T. Brögelmann, N.C. Kruppe, M. Engels

Surface Engineering Institute, RWTH Aachen University, Kackertstr. 15, 52072 Aachen, Germany

15:40-16:00 COFFEE BREAK, POSTER SESSION AND EXHIBITION

Second Afternoon Session.

Moderator: Papken Eh. Hovsepian, Sheffield Hallam University, UK

16:00-16:20 The Effect of Cr Content on Microstructure and Mechanical Properties of AlCrTiN Films Deposited by a Hybrid System with HIPIMS and dcMS

H. Zhou 1 , J. Zheng1, B. Gui1, D. Geng2, Q. Wang2

1 Lanzhou Insitute of Physics, P.R. China

2School of Electromechanical Engineering, Guangdong University of Technology, P.R. China

16:20-16:40 High Rate HiPIMS for Cutting Tool Coatings

T. Leyendecker, O. Lemmer, W. Kölker, C. Schiffers

CemeCon AG, Adenauerstrasse 20A4, 52146 Würselen, Germany

16:40-17:00 Performance Comparison of DC and HiPIMS TiAlN Coatings in Metal Cutting

J. Kohlscheen 1 , Michael Schneeweiß2

Kennametal GmbH, Altweiherstr. 27, Ebermannstadt, Germany

University of Applied Sciences, Zwickau, Germany

17:00-17:20 Tribological behaviour of Mo–W doped carbon-based coating

R. Jacobs 1 , R. Tietema1, D. Doerwald1, G.-J. Fransen1, A.P. Ehiasarian2 , P.Eh. Hovsepian2

1 IHI Hauzer Techno Coating B.V., The Netherlands

2 Sheffield Hallam University, United Kingdom

17:20-17:40 Advanced Power Delivery Control in High Power Impulse Plasma Magnetron Sputtering Process

W. Gajewski 1 , P. Rózanski1, M. Baran1, P. Ozimek1, M. Zelechowski1, L. Zajac2, M. Jasinski2

1 TRUMPF Huettinger, Marecka 47, 05-220 Zielonka, Poland

2 Warsaw University of Technology, Institute of Control and Industrial Electronics,

Koszykowa 75, 00-662 Warsaw, Polanda

17:40-18:00 HiPIMS Power Supply Technology

G. Eichenhofer1, Carl. de la Viesca2, I. Fernandez3, A. Wennberg3, Cec. de la Viesca2

1 hiPV c/o 4A-PLASMA, Aichtalstr. 66, D-71088 Holzgerlingen; Germany

2 hiPV c/o INGENIERIA VIESCA, S.L; E-28802 Alcalá de Henares; Spain

3 hiPV c/o Nano4Energy S.L.N.E.; E-28006 Madrid; Spain

19:30 CONFERENCE DINNER: CUTLERS' HALL, SHEFFIELD

Thursday, 30 June 2016.

First Morning Session.

Moderator: Arutiun P. Ehiasarian, Sheffield Hallam University, UK

8:30-9:00 Influence of High Voltage Pulsed Bias on Surfaces Treated by HiPIMS

M. Froehlich 1 , S. Gauter2, W. Garkas1, K.-D. Weltmann1, H. Kersten2,M. Polak1

1Leibniz Institute for Plasma Science and Technology (INP), Greifswald, Germany

2Institute of Experimental and Applied Physics, Kiel University, Kiel, Germany

9:00-9:20 Low-Temperature Growth of Dense, Hard Ti1-x-yAlxTayN Alloy Films Via Hybrid HiPIMS/Magnetron Co-Sputtering Using Synchronized Metal-Ion Irradiation

O. Tengstrand 1 , H. Fager1, J. Lu1, S. Bolz2, B. Mesic2, W. Kölker2, Ch. Schiffers2,

O.Lemmer2, I. Petrov1,3, J. E. Greene1,3, L. Hultman1, G. Greczynski1

1 Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University,SE-581 83 Linköping, Sweden

2 CemeCon AG, Adenauerstr. 20 A4, D-52146 Würselen, Germany

3 Frederick Seitz Materials Research Laboratory and Materials Science Department, University of Illinois,104 South Goodwin, Urbana, Illinois 61801, USA

9:20-9:40 Deposition of Cu/Mo Multilayers by Bias HiPIMS for X-Band Accelerating Structures

V. Rigato 1 , M. Campostrini1,2, B. Spataro3

1 INFN, Laboratori Nazionali di Legnaro, Legnaro (Padova), Italy.

2 Department of Industrial Engineering- University of Trento, (Trento), Italy.

3 INFN, Laboratori Nazionali di Frascati, Frascati, (Rome) Italy.

9:40-10:00 Copper thin films deposited under different power deliver modes and magnetron configurations: A comparative study

I.-L. Velicu1, V. Tiron1, B.-G. Rusu2, G. Popa1

1Faculty of Physics, Alexandru Ioan Cuza University, Blvd. Carol I nr. 11, Iasi-700506, Romania

2 Department of Pedotechnics, Faculty of Agriculture, University of Agricultural Sciences and Veterinary Medicine “Ion Ionescu de la Brad” of Iasi, Sadoveanu Alley nr. 3, Iasi-700490, Romania

10:00-10:20 Time-Resolved Ion Flux and Impedance Measurements in Reactive High-Power Impulse Magnetron Sputtering

M. Cada 1 , D. Lundin2 and Z. Hubicka1

1 Institute of Physics ASCR, v. v. i., Na Slovance 2, 182 21 Prague 8, Czech Republic

2 Laboratoire de Physique des Gaz et des Plasmas — LPGP, UMR 8578, CNRS — Université Paris-Sud, 91405 Orsay, France

10:20-10:40 COFFEE BREAK, POSTER SESSION AND EXHIBITION

Second Morning Session.

Moderator: A.Anders, Lawrence Berkeley National Laboratory, USA

10:40-11:00 Measurement of deposition rate, ionized flux fraction and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance

S. Sharma

Impedans Ltd,Chase House, City Junction Business Park, Northern Cross, Dublin 17, D17 AK63, Ireland.

11:00-11:20 Plasma Diagnostics in Reactive High Power Magnetron Sputtering in Ar+H2S Gas Mixture

Z. Hubicka, M. Cada, J. Olejnícek, Š. Kment

Institute of Physics AS CR, Na Slovance 2 182 21 Prague 8 Czech Republi c

11:20-11:40 Properties and Process Control of Reactively Sputtered Alumina Coatings with a Novel HIPIMS Approach.

F. Papa1, I. Fernandez2, A. Wennberg2, B. Daniel3, V. Bellido-Gonzalez3

1 Gencoa USA, Davis, CA, USA,

2 Nano4Energy, Madrid, Spain

3 Gencoa Ltd., Liverpool, UK


Poster Presentations.

Exhibition Hall - 29 and 30 June 2016.

1. Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique.

Y. P. Purandare , A. P. Ehiasarian, and P. Eh Hovsepian

National HIPIMS Technology Centre, Materials and Engineering Research Institute, Sheffield Hallam University, UK S1 1WB

2. Analysing deposited Au-films on 3D structured aluminum alloy substrates as a function of the HiPIMS parameters

Sascha Hilt 1 , Frank Schmaljohann1, Daniel Hagedorn1, Frank Löffler1, Ralf Bandorf2, Günter Bräuer2

1 Physikalisch-Technische Bundesanstalt, Bundesallee 100, D-38116 Braunschweig

2 Fraunhofer-Institut für Schicht- und Oberflächentechnik IST, Bienroder Weg 54 E, D-38108 Braunschweig .

3. Optimization of deposition rate in HiPIMS through the control of magnetic field and pulsing configuration

Vasile TIRON, Ioana-Laura VELICU, Ilarion MIHAILA and Gheorghe POPA

Iasi Plasma Advanced Research Center (iPARC), Faculty of Physics, Alexandru Ioan Cuza University, Bvd. Carol I nr. 11, Iasi-700506, Romania.

4. Impact of growth defects on the corrosion behaviour of CrN/NbN coatings deposited by HIPIMS/UBM

B.Biswas , P. Hovsepian

National HIPIMS Technology Centre, Sheffield Hallam University, Sheffield, S1 1WB, UK

5. Highly Ionized Deposition of CrN using MPP

H. Gerdes, A. Themelis, R. Bandorf, G. Bräuer

Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, Braunschweig, Germany

6. Investigations on spoke behaviour in reactive HiPIMS with ICCD measurements and energy and time resolved mass spectrometry.

W. Breilmann, A. Eitrich, C. Maszl, A. Hecimovic, J. Benedikt and A. von Keudell

Ruhr-Universität Bochum, Germany


7. Current-Voltage Characteristics of a DC Magnetron with a Hot Target

A.S. Bondarenko, V.V. Karzin, V.V. Smirnov

St. Petersburg State Electrotechnical University, Department of Physical Electronics and Technology, 5 Prof. Popov St., St. Petersburg, Russia

8. The Model of Nitride Films Deposition Using the High Power Reactive Magnetron Sputtering Technique

V.V. Karzin, A.S. Bondarenko, A.A. Komlev, I.L. Mylnikov

St. Petersburg State Electrotechnical University, Department of Physical Electronics and Technology, 5 Prof. Popov St., St. Petersburg, Russia

9. Corrosion Properties of PVD Coatings Grown by Combined High Power Impulse Magnetron Sputtering /Direct Current Magnetron Sputtering and Arc Evaporation Techniques

Arunprabhu A. Sugumaran, Yashodhan Purandare, Arutiun P. Ehiasarian and Papken Eh. Hovsepian

Nanotechnology Centre for PVD Research, Sheffield Hallam University, Howard Street, Sheffield, S1 1WB, United Kingdom

10. The Influence of the Reactive Gas Flow on the Structure and Properties of TiAlCN/VCN Films

Anna W. Oniszczuk1, Arutiun P. Ehiasarian1, Carl-Fredrik Carlström2, Mats Ahlgren2

1 HIPIMS Technology Centre, Sheffield Hallam University, Sheffield, UK
2 Sandvik Coromant, Sweden

11. Effects of charge voltage on fabrication of AlCrN coatings by a high power impulse magnetron sputtering

Jun Zheng1, Hui Zhou1, Binhua Gui1, Haixu Li2, Qimin Wang2

1 Lanzhou Insitute of Physics, Lanzhou, P.R. China

2School of Electromechanical Engineering, Guangdong University of Technology, P.R. China

12. Study of the effects of HIPIMS pulse packages on the peculiarities of carbon nanotubes creation during the growth of diamond like carbon composite matrix

Vachagan Meliksetyan,

Yerevan State University,Yerevan, Armenia

12:00-14:00 LUNCH BREAK

CLOSE of CONFERENCE

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